Chin. J. Semicond. > 1987, Volume 8 > Issue 4 > 395-401

CONTENTS

二元化合物总原子溅射率和刻蚀速率的经验公式

陈国樑

PDF

  • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2665 Times PDF downloads: 1130 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 April 1987

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      陈国樑. 二元化合物总原子溅射率和刻蚀速率的经验公式[J]. 半导体学报(英文版), 1987, 8(4): 395-401.
      Citation:
      陈国樑. 二元化合物总原子溅射率和刻蚀速率的经验公式[J]. 半导体学报(英文版), 1987, 8(4): 395-401.

      • Received Date: 2015-08-19

      Catalog

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return