Chin. J. Semicond. > 1995, Volume 16 > Issue 11 > 849-853
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77K NMOSFET沟道热载流子注入效应

刘卫东，李志坚，刘理天，魏同立

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    Received: 19 August 2015 Revised: Online: Published: 01 November 1995

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      Article Navigation >  Journal of Semiconductors  > 1995  >  16(11): 849-853
      刘卫东，李志坚，刘理天，魏同立. 77K NMOSFET沟道热载流子注入效应[J]. 半导体学报(英文版), 1995, 16(11): 849-853.
      Citation:
      刘卫东，李志坚，刘理天，魏同立. 77K NMOSFET沟道热载流子注入效应[J]. 半导体学报(英文版), 1995, 16(11): 849-853.
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      • Received Date: 2015-08-19

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