Chin. J. Semicond. > 1990, Volume 11 > Issue 3 > 215-220
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衬底预非晶化对低能硼注入硅形成浅结的影响

卢志恒 , 李素杰 , 张朝明 , 罗晏 and 张荟星

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    Received: 19 August 2015 Revised: Online: Published: 01 March 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(3): 215-220
      卢志恒, 李素杰, 张朝明, 罗晏, 张荟星. 衬底预非晶化对低能硼注入硅形成浅结的影响[J]. 半导体学报(英文版), 1990, 11(3): 215-220.
      Citation:
      卢志恒, 李素杰, 张朝明, 罗晏, 张荟星. 衬底预非晶化对低能硼注入硅形成浅结的影响[J]. 半导体学报(英文版), 1990, 11(3): 215-220.
      shu

      • Received Date: 2015-08-19

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