Chin. J. Semicond. > 1993, Volume 14 > Issue 10 > 633-636
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高温热处理对SiGe:GaP中电子散射机构的影响

高敏 and D.M.Rowe

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    Received: 20 August 2015 Revised: Online: Published: 01 October 1993

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      Article Navigation >  Journal of Semiconductors  > 1993  >  14(10): 633-636
      高敏, D.M.Rowe. 高温热处理对SiGe:GaP中电子散射机构的影响[J]. 半导体学报(英文版), 1993, 14(10): 633-636.
      Citation:
      高敏, D.M.Rowe. 高温热处理对SiGe:GaP中电子散射机构的影响[J]. 半导体学报(英文版), 1993, 14(10): 633-636.
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      • Received Date: 2015-08-20

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