| Citation: |
Chen Shaofeng, Xia Shanhong, Song Qinglin, Zhang Jiangang. A Method for Suspending Ultra-Thin Film Etching[J]. Journal of Semiconductors, 2003, 24(S1): 104-106.
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Chen S F, Xia S H, Song Q L, Zhang J G. A Method for Suspending Ultra-Thin Film Etching[J]. Chin. J. Semicond., 2003, 24(S1): 104.
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A Method for Suspending Ultra-Thin Film Etching
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Abstract
A method of thin film etching and the relevant Equipment are introduced. A way of fabricating large-area suspending ultra-thin films (thickness of them, 50~ 500nm, 1~ 5Mm; area of them, 3mm × 2mm, 10mm × 5mm) with metal electrodes is provided. Rate of finished products will increase by 30 per cent. The equipment has many advantages such as simple structure, small volume, light weight, low cost, easy to process, convenient to operate, and is capable of design and manufacture its form according to the need of devices.-
Keywords:
- suspending,
- thin film,
- etching
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References
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Proportional views
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