Chin. J. Semicond. > 2000, Volume 21 > Issue 8 > 778-785
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用弹道电子发射显微术研究超薄金属硅化物/硅肖特基接触

茹国平 , 屈新萍 , 竺士炀 and 李炳宗

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Key words: 肖特基势垒, 弹道电子显微术, 硅化物, 离子轰击

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    Received: 20 August 2015 Revised: Online: Published: 01 August 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(8): 778-785
      茹国平, 屈新萍, 竺士炀, 李炳宗. 用弹道电子发射显微术研究超薄金属硅化物/硅肖特基接触[J]. 半导体学报(英文版), 2000, 21(8): 778-785.
      Citation:
      茹国平, 屈新萍, 竺士炀, 李炳宗. 用弹道电子发射显微术研究超薄金属硅化物/硅肖特基接触[J]. 半导体学报(英文版), 2000, 21(8): 778-785.
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      • Received Date: 2015-08-20

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