| Citation: |
Zhang Xiaodan, Zhang Farong, Zhao Ying, Chen Fei, Sun Jian, Wei Changchun, Geng Xinhua, Xiong Shaozhen. Fabrication of 1nm/s High Deposition Microcrystalline Silicon and Its Application in Solar Cells[J]. Journal of Semiconductors, 2007, 28(2): 209-212.
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Zhang X D, Zhang F R, Zhao Y, Chen F, Sun J, Wei C C, Geng X H, Xiong S Z. Fabrication of 1nm/s High Deposition Microcrystalline Silicon and Its Application in Solar Cells[J]. Chin. J. Semicond., 2007, 28(2): 209.
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Fabrication of 1nm/s High Deposition Microcrystalline Silicon and Its Application in Solar Cells
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Abstract
A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different silane concentrations using relatively high pressure and power.The deposition rate of the materials increases with the increase of the silane concentration.Through analysis of the structural and electrical properties of the materials,it can be concluded that with a high deposition rate (above 1nm/s),device-quality microcrystalline silicon is obtained.As a result,a microcrystalline silicon solar cell with 6.3% conversion efficiency is obtained. -
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