Chin. J. Semicond. > 1998, Volume 19 > Issue 11 > 829-833
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与硅平面工艺兼容的p~-/p~+型多孔硅的发光特性研究

孙鲁 , 张树霖 , 张录 , 关旭东 and 韩汝琦

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    Received: 18 August 2015 Revised: Online: Published: 01 November 1998

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      Article Navigation >  Journal of Semiconductors  > 1998  >  19(11): 829-833
      孙鲁, 张树霖, 张录, 关旭东, 韩汝琦. 与硅平面工艺兼容的p~-/p~+型多孔硅的发光特性研究[J]. 半导体学报(英文版), 1998, 19(11): 829-833.
      Citation:
      孙鲁, 张树霖, 张录, 关旭东, 韩汝琦. 与硅平面工艺兼容的p~-/p~+型多孔硅的发光特性研究[J]. 半导体学报(英文版), 1998, 19(11): 829-833.
      shu

      • Received Date: 2015-08-18

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