Chin. J. Semicond. > 2003, Volume 24 > Issue 1 > 63-67
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Co/C/Si(100)结构固相外延生长CoSi_2

屈新萍 , 徐蓓蕾 , 茹国平 , 李炳宗 , W Y Cheung , S P Wong and Paul K Chu

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Key words: 固相反应, 固相外延, 金属硅化物

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    Received: 20 August 2015 Revised: Online: Published: 01 January 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(1): 63-67
      屈新萍, 徐蓓蕾, 茹国平, 李炳宗, W Y Cheung, S P Wong, Paul K Chu. Co/C/Si(100)结构固相外延生长CoSi_2[J]. 半导体学报(英文版), 2003, 24(1): 63-67.
      Citation:
      屈新萍, 徐蓓蕾, 茹国平, 李炳宗, W Y Cheung, S P Wong, Paul K Chu. Co/C/Si(100)结构固相外延生长CoSi_2[J]. 半导体学报(英文版), 2003, 24(1): 63-67.
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      • Received Date: 2015-08-20

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