Chin. J. Semicond. > 1992, Volume 13 > Issue 6 > 386-391

CONTENTS

PECVD SiON膜的性质及其在双层互连工艺中的应用

曾天亮 , 陈平 , 江志庚 and 李志彭

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 3086 Times PDF downloads: 2486 Times Cited by: 0 Times

    History

    Received: 19 August 2015 Revised: Online: Published: 01 June 1992

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1992  >  13(6): 386-391
      曾天亮, 陈平, 江志庚, 李志彭. PECVD SiON膜的性质及其在双层互连工艺中的应用[J]. 半导体学报(英文版), 1992, 13(6): 386-391.
      Citation:
      曾天亮, 陈平, 江志庚, 李志彭. PECVD SiON膜的性质及其在双层互连工艺中的应用[J]. 半导体学报(英文版), 1992, 13(6): 386-391.
      shu

      • Received Date: 2015-08-19

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return