Chin. J. Semicond. > 1994, Volume 15 > Issue 4 > 235-242
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Co／Ti／Si三元固相反应外延生长CoSi2薄膜

刘平，李炳宗，孙臻，顾志光，黄维宁，周祖尧，倪如山

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    Received: 18 August 2015 Revised: Online: Published: 01 April 1994

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      Article Navigation >  Journal of Semiconductors  > 1994  >  15(4): 235-242
      刘平，李炳宗，孙臻，顾志光，黄维宁，周祖尧，倪如山. Co／Ti／Si三元固相反应外延生长CoSi2薄膜[J]. 半导体学报(英文版), 1994, 15(4): 235-242.
      Citation:
      刘平，李炳宗，孙臻，顾志光，黄维宁，周祖尧，倪如山. Co／Ti／Si三元固相反应外延生长CoSi2薄膜[J]. 半导体学报(英文版), 1994, 15(4): 235-242.
      shu

      • Received Date: 2015-08-18

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