Citation: |
Jiang Huihua, Yang Deren, Tian Daxi, Ma Xiangyang, Li Liben, Que Duanlin. Effects of Germanium on Oxygen Precipitation in Heavily Boron-Doped Czochralski Silicon[J]. Journal of Semiconductors, 2005, 26(11): 2107-2110.
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Jiang H H, Yang D R, Tian D X, Ma X Y, Li L B, Que D L. Effects of Germanium on Oxygen Precipitation in Heavily Boron-Doped Czochralski Silicon[J]. Chin. J. Semicond., 2005, 26(11): 2107.
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Effects of Germanium on Oxygen Precipitation in Heavily Boron-Doped Czochralski Silicon
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Abstract
Oxygen precipitation in conventional heavily B-doped Czochralski (CZ) silicon (HB-Si) and heavily Ge-B codoped CZ silicon (Ge codoped HB-Si) subjected to single step annealing at 650~1150℃ for 64h or low-high two step annealing(650℃/16h+1000℃/16h and 800℃/4~128h+1000℃/16h) are comparatively investigated.It is found that the density of bulk microdefects (BMDs) in Ge codoped HB-Si is much lower than that in HB-Si.The mechanism of which is preliminarily discussed. -
References
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