Citation: |
张佩君, 黄庆安. 硅片直接键合杂质分布的模型与模拟[J]. 半导体学报(英文版), 2003, 24(8): 887-891.
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References
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Proportional views
Key words: 硅片直接键合, 本征氧化层, 扩散, 微机电系统, 功率器件
Article views: 2364 Times PDF downloads: 1143 Times Cited by: 0 Times
Received: 20 August 2015 Revised: Online: Published: 01 August 2003
Citation: |
张佩君, 黄庆安. 硅片直接键合杂质分布的模型与模拟[J]. 半导体学报(英文版), 2003, 24(8): 887-891.
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