Chin. J. Semicond. > 1997, Volume 18 > Issue 6 > 466-469
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注F场氧介质总剂量辐照的研究

张国强 , 余学锋 , 郭旗 , 任迪远 , 严荣良 , 赵元富 and 胡浴红

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    Received: 19 August 2015 Revised: Online: Published: 01 June 1997

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      Article Navigation >  Journal of Semiconductors  > 1997  >  18(6): 466-469
      张国强, 余学锋, 郭旗, 任迪远, 严荣良, 赵元富, 胡浴红. 注F场氧介质总剂量辐照的研究[J]. 半导体学报(英文版), 1997, 18(6): 466-469.
      Citation:
      张国强, 余学锋, 郭旗, 任迪远, 严荣良, 赵元富, 胡浴红. 注F场氧介质总剂量辐照的研究[J]. 半导体学报(英文版), 1997, 18(6): 466-469.
      shu

      • Received Date: 2015-08-19

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