Chin. J. Semicond. > 2001, Volume 22 > Issue 8 > 1007-1010
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SIMOX材料顶层硅膜中残余氧的行为

李映雪 , 张兴 , 黄如 , 王阳元 and 罗晏

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Key words: 光致发光谱, SIMOX, SOI, SIMS, 残余氧

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    Received: 20 August 2015 Revised: Online: Published: 01 August 2001

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      Article Navigation >  Journal of Semiconductors  > 2001  >  22(8): 1007-1010
      李映雪, 张兴, 黄如, 王阳元, 罗晏. SIMOX材料顶层硅膜中残余氧的行为[J]. 半导体学报(英文版), 2001, 22(8): 1007-1010.
      Citation:
      李映雪, 张兴, 黄如, 王阳元, 罗晏. SIMOX材料顶层硅膜中残余氧的行为[J]. 半导体学报(英文版), 2001, 22(8): 1007-1010.
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      • Received Date: 2015-08-20

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