Chin. J. Semicond. > 1990, Volume 11 > Issue 12 > 946-949
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Ce-Si多层膜中铈硅化物的形成

何杰 , 许振嘉 , 钱家骏 , 王玉田 and 王佑祥

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    Received: 19 August 2015 Revised: Online: Published: 01 December 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(12): 946-949
      何杰, 许振嘉, 钱家骏, 王玉田, 王佑祥. Ce-Si多层膜中铈硅化物的形成[J]. 半导体学报(英文版), 1990, 11(12): 946-949.
      Citation:
      何杰, 许振嘉, 钱家骏, 王玉田, 王佑祥. Ce-Si多层膜中铈硅化物的形成[J]. 半导体学报(英文版), 1990, 11(12): 946-949.
      shu

      • Received Date: 2015-08-19

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