Chin. J. Semicond. > 1999, Volume 20 > Issue 3 > 260-264

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AlAs选择性湿氮氧化的工艺条件对氧化速率的影响

张益 , 潘钟 , 杜云 , 黄永箴 and 吴荣汉

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(3): 260-264
      张益, 潘钟, 杜云, 黄永箴, 吴荣汉. AlAs选择性湿氮氧化的工艺条件对氧化速率的影响[J]. 半导体学报(英文版), 1999, 20(3): 260-264.
      Citation:
      张益, 潘钟, 杜云, 黄永箴, 吴荣汉. AlAs选择性湿氮氧化的工艺条件对氧化速率的影响[J]. 半导体学报(英文版), 1999, 20(3): 260-264.
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      • Received Date: 2015-08-20

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