Chin. J. Semicond. > 1986, Volume 7 > Issue 6 > 617-623

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H_2O在Si(100)面上化学吸附的理论研究

曹培林

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    Received: 20 August 2015 Revised: Online: Published: 01 June 1986

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      曹培林. H_2O在Si(100)面上化学吸附的理论研究[J]. 半导体学报(英文版), 1986, 7(6): 617-623.
      Citation:
      曹培林. H_2O在Si(100)面上化学吸附的理论研究[J]. 半导体学报(英文版), 1986, 7(6): 617-623.

      • Received Date: 2015-08-20

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