Chin. J. Semicond. > 1983, Volume 4 > Issue 4 > 403-406
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Si(100)清洁表面吸附氢的功函数变化

陈炳来 , 庄承群 and 王迅

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    Received: 20 August 2015 Revised: Online: Published: 01 April 1983

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      Article Navigation >  Journal of Semiconductors  > 1983  >  4(4): 403-406
      陈炳来, 庄承群, 王迅. Si(100)清洁表面吸附氢的功函数变化[J]. 半导体学报(英文版), 1983, 4(4): 403-406.
      Citation:
      陈炳来, 庄承群, 王迅. Si(100)清洁表面吸附氢的功函数变化[J]. 半导体学报(英文版), 1983, 4(4): 403-406.
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      • Received Date: 2015-08-20

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