Chin. J. Semicond. > 2002, Volume 23 > Issue 4 > 394-398
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高压热处理对氧沉淀低温形核的影响

徐进 , 杨德仁 , 马向阳 , 李春龙 , 阙端麟 and A Misiuk

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Key words: 高压, 氧沉淀, 热施主, 硅

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    Received: 19 August 2015 Revised: Online: Published: 01 April 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(4): 394-398
      徐进, 杨德仁, 马向阳, 李春龙, 阙端麟, A Misiuk. 高压热处理对氧沉淀低温形核的影响[J]. 半导体学报(英文版), 2002, 23(4): 394-398.
      Citation:
      徐进, 杨德仁, 马向阳, 李春龙, 阙端麟, A Misiuk. 高压热处理对氧沉淀低温形核的影响[J]. 半导体学报(英文版), 2002, 23(4): 394-398.
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      • Received Date: 2015-08-19

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