Chin. J. Semicond. > 2007, Volume 28 > Issue 2 > 200-203

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Effect of Pretreatment on Thermal Donors in Neutron-Irradiated Czochralski Silicon

Deng Xiaoran and Yang Shuai

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Abstract: The influence of pretreatment on the thermal donors (TD) in neutron-irradiated Czochralski silicon is investigated with four-point probe measurement and Fourier transform infrared spectrometry.The results show that the amount and the generation rate of the thermal donors are depressed after preheating treatment at 650℃.After rapid thermal processing at 1200℃ in N2 atmosphere,the number of the donors is depressed in irradiated silicon; but in Ar atmosphere,the number of the donors is depressed in non-irradiated silicon.

Key words: neutron irradiation thermal donor Czochralski silicon irradiated defect

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    Received: 18 August 2015 Revised: 25 October 2006 Online: Published: 01 February 2007

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      Deng Xiaoran, Yang Shuai. Effect of Pretreatment on Thermal Donors in Neutron-Irradiated Czochralski Silicon[J]. Journal of Semiconductors, 2007, 28(2): 200-203. ****Deng X R, Yang S. Effect of Pretreatment on Thermal Donors in Neutron-Irradiated Czochralski Silicon[J]. Chin. J. Semicond., 2007, 28(2): 200.
      Citation:
      Deng Xiaoran, Yang Shuai. Effect of Pretreatment on Thermal Donors in Neutron-Irradiated Czochralski Silicon[J]. Journal of Semiconductors, 2007, 28(2): 200-203. ****
      Deng X R, Yang S. Effect of Pretreatment on Thermal Donors in Neutron-Irradiated Czochralski Silicon[J]. Chin. J. Semicond., 2007, 28(2): 200.

      Effect of Pretreatment on Thermal Donors in Neutron-Irradiated Czochralski Silicon

      • Received Date: 2015-08-18
      • Accepted Date: 2006-07-19
      • Revised Date: 2006-10-25
      • Published Date: 2007-01-30

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