Chin. J. Semicond. > 1999, Volume 20 > Issue 2 > 172-176

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Sol-Gel法制备的铁电薄膜和Pt/Ti下电极的反应离子刻蚀技术

陈峥 , 汤庭鳌 and 邹斯洵

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    Received: 20 August 2015 Revised: Online: Published: 01 February 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(2): 172-176
      陈峥, 汤庭鳌, 邹斯洵. Sol-Gel法制备的铁电薄膜和Pt/Ti下电极的反应离子刻蚀技术[J]. 半导体学报(英文版), 1999, 20(2): 172-176.
      Citation:
      陈峥, 汤庭鳌, 邹斯洵. Sol-Gel法制备的铁电薄膜和Pt/Ti下电极的反应离子刻蚀技术[J]. 半导体学报(英文版), 1999, 20(2): 172-176.
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      • Received Date: 2015-08-20

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