Chin. J. Semicond. > 1999, Volume 20 > Issue 10 > 841-845

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铕离子注入氧化硅膜光发射的研究

王亮 , 朱美芳 , 郑怀德 , 侯延冰 and 刘丰珍

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    Received: 19 August 2015 Revised: Online: Published: 01 October 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(10): 841-845
      王亮, 朱美芳, 郑怀德, 侯延冰, 刘丰珍. 铕离子注入氧化硅膜光发射的研究[J]. 半导体学报(英文版), 1999, 20(10): 841-845.
      Citation:
      王亮, 朱美芳, 郑怀德, 侯延冰, 刘丰珍. 铕离子注入氧化硅膜光发射的研究[J]. 半导体学报(英文版), 1999, 20(10): 841-845.
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      • Received Date: 2015-08-19

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