Chin. J. Semicond. > 1999, Volume 20 > Issue 3 > 183-187
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PECVD SiN_x薄膜应力的研究

赵永军 , 王民娟 , 杨拥军 and 梁春广

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    Received: 20 August 2015 Revised: Online: Published: 01 March 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(3): 183-187
      赵永军, 王民娟, 杨拥军, 梁春广. PECVD SiN_x薄膜应力的研究[J]. 半导体学报(英文版), 1999, 20(3): 183-187.
      Citation:
      赵永军, 王民娟, 杨拥军, 梁春广. PECVD SiN_x薄膜应力的研究[J]. 半导体学报(英文版), 1999, 20(3): 183-187.
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      • Received Date: 2015-08-20

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