Chin. J. Semicond. > 2003, Volume 24 > Issue 10 > 1035-1039
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高温快速热处理对硅中热施主的影响

裴艳丽 , 杨德仁 , 马向阳 , 樊瑞新 and 阙端麟

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Key words: 热施主, 快速热处理, 硅

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    Received: 20 August 2015 Revised: Online: Published: 01 October 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(10): 1035-1039
      裴艳丽, 杨德仁, 马向阳, 樊瑞新, 阙端麟. 高温快速热处理对硅中热施主的影响[J]. 半导体学报(英文版), 2003, 24(10): 1035-1039.
      Citation:
      裴艳丽, 杨德仁, 马向阳, 樊瑞新, 阙端麟. 高温快速热处理对硅中热施主的影响[J]. 半导体学报(英文版), 2003, 24(10): 1035-1039.
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      • Received Date: 2015-08-20

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