Chin. J. Semicond. > 2003, Volume 24 > Issue 4 > 433-437

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Key words: 铜, 阻挡层, 两步抛光, ULSI, 多层布线

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    Received: 20 August 2015 Revised: Online: Published: 01 April 2003

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      王弘英, 刘玉岭, 郝景晨, 魏碧华. ULSI制备中铜布线的两步抛光技术[J]. 半导体学报(英文版), 2003, 24(4): 433-437.
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      王弘英, 刘玉岭, 郝景晨, 魏碧华. ULSI制备中铜布线的两步抛光技术[J]. 半导体学报(英文版), 2003, 24(4): 433-437.

      • Received Date: 2015-08-20

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