Chin. J. Semicond. > 1990, Volume 11 > Issue 12 > 906-914
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铬硅化物的形成及其界面反应

丁孙安 , 许振嘉 , 李宝骐 and 周一峰

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    Received: 19 August 2015 Revised: Online: Published: 01 December 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(12): 906-914
      丁孙安, 许振嘉, 李宝骐, 周一峰. 铬硅化物的形成及其界面反应[J]. 半导体学报(英文版), 1990, 11(12): 906-914.
      Citation:
      丁孙安, 许振嘉, 李宝骐, 周一峰. 铬硅化物的形成及其界面反应[J]. 半导体学报(英文版), 1990, 11(12): 906-914.
      shu

      • Received Date: 2015-08-19

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