Chin. J. Semicond. > 1998, Volume 19 > Issue 5 > 381-384
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铁杂质对微氮硅中氧沉淀的影响

张溪文 , 杨德仁 and 阙端麟

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    Received: 18 August 2015 Revised: Online: Published: 01 May 1998

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      Article Navigation >  Journal of Semiconductors  > 1998  >  19(5): 381-384
      张溪文, 杨德仁, 阙端麟. 铁杂质对微氮硅中氧沉淀的影响[J]. 半导体学报(英文版), 1998, 19(5): 381-384.
      Citation:
      张溪文, 杨德仁, 阙端麟. 铁杂质对微氮硅中氧沉淀的影响[J]. 半导体学报(英文版), 1998, 19(5): 381-384.
      shu

      • Received Date: 2015-08-18

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