Chin. J. Semicond. > 1992, Volume 13 > Issue 12 > 756-762
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快速热退火多晶硅薄膜压阻特性研究

曹子祥 , 黄永宏 , 王思杰 and 陈怀溥

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    Received: 19 August 2015 Revised: Online: Published: 01 December 1992

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      Article Navigation >  Journal of Semiconductors  > 1992  >  13(12): 756-762
      曹子祥, 黄永宏, 王思杰, 陈怀溥. 快速热退火多晶硅薄膜压阻特性研究[J]. 半导体学报(英文版), 1992, 13(12): 756-762.
      Citation:
      曹子祥, 黄永宏, 王思杰, 陈怀溥. 快速热退火多晶硅薄膜压阻特性研究[J]. 半导体学报(英文版), 1992, 13(12): 756-762.
      shu

      • Received Date: 2015-08-19

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