Chin. J. Semicond. > 1999, Volume 20 > Issue 9 > 837-840

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ECR Plasma CVD法淀积介质膜技术在半导体光电器件中的应用

茅冬生 and 谭满清

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    Received: 19 August 2015 Revised: Online: Published: 01 September 1999

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      Article Navigation >  Journal of Semiconductors  > 1999  >  20(9): 837-840
      茅冬生, 谭满清. ECR Plasma CVD法淀积介质膜技术在半导体光电器件中的应用[J]. 半导体学报(英文版), 1999, 20(9): 837-840.
      Citation:
      茅冬生, 谭满清. ECR Plasma CVD法淀积介质膜技术在半导体光电器件中的应用[J]. 半导体学报(英文版), 1999, 20(9): 837-840.
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      • Received Date: 2015-08-19

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