Chin. J. Semicond. > 1999, Volume 20 > Issue 10 > 916-920

“Zero”DependenceofDepositionRateonDepositionTemperatureinPhotoChemicalVaporDeposition

Sun Jiancheng , Li Enke , Li Peixian , Wang Yuqing , Zhang Heming , Jiang Wenqing , Dai Xianying and Hu Huiyong

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Received: 19 August 2015 Revised: Online: Published: 01 October 1999

Article Navigation > Journal of Semiconductors > 1999 > 20(10): 916-920

Sun Jiancheng, Li Enke, Li Peixian, Wang Yuqing, Zhang Heming, Jiang Wenqing, Dai Xianying, Hu Huiyong. “Zero”DependenceofDepositionRateonDepositionTemperatureinPhotoChemicalVaporDeposition[J]. 半导体学报(英文版), 1999, 20(10): 916-920.

Citation:

Sun Jiancheng, Li Enke, Li Peixian, Wang Yuqing, Zhang Heming, Jiang Wenqing, Dai Xianying, Hu Huiyong. “Zero”DependenceofDepositionRateonDepositionTemperatureinPhotoChemicalVaporDeposition[J]. 半导体学报(英文版), 1999, 20(10): 916-920.

Sun Jiancheng, Li Enke, Li Peixian, Wang Yuqing, Zhang Heming, Jiang Wenqing, Dai Xianying, Hu Huiyong. “Zero”DependenceofDepositionRateonDepositionTemperatureinPhotoChemicalVaporDeposition[J]. 半导体学报(英文版), 1999, 20(10): 916-920.

Citation:

Sun Jiancheng, Li Enke, Li Peixian, Wang Yuqing, Zhang Heming, Jiang Wenqing, Dai Xianying, Hu Huiyong. “Zero”DependenceofDepositionRateonDepositionTemperatureinPhotoChemicalVaporDeposition[J]. 半导体学报(英文版), 1999, 20(10): 916-920.

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