Chin. J. Semicond. > 1988, Volume 9 > Issue 2 > 175-180
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硅片抛光工艺质量微细差别的椭偏光谱法鉴别

陈哉 and 钱佑华

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    Received: 19 August 2015 Revised: Online: Published: 01 February 1988

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      Article Navigation >  Journal of Semiconductors  > 1988  >  9(2): 175-180
      陈哉, 钱佑华. 硅片抛光工艺质量微细差别的椭偏光谱法鉴别[J]. 半导体学报(英文版), 1988, 9(2): 175-180.
      Citation:
      陈哉, 钱佑华. 硅片抛光工艺质量微细差别的椭偏光谱法鉴别[J]. 半导体学报(英文版), 1988, 9(2): 175-180.
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      • Received Date: 2015-08-19

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