Chin. J. Semicond. > 2003, Volume 24 > Issue 10 > 1053-1056
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直流反应磁控溅射Zn_(1-x)Cd)_xO薄膜的研究

马德伟1078 , 叶志镇 , 黄靖1084云 and 赵炳辉 1089

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Key words: Zn1-xCdxO薄膜, 磁控溅射, 禁带宽度

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    Received: 20 August 2015 Revised: Online: Published: 01 October 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(10): 1053-1056
      马德伟1078, 叶志镇, 黄靖1084云, 赵炳辉 1089. 直流反应磁控溅射Zn_(1-x)Cd)_xO薄膜的研究[J]. 半导体学报(英文版), 2003, 24(10): 1053-1056.
      Citation:
      马德伟1078, 叶志镇, 黄靖1084云, 赵炳辉 1089. 直流反应磁控溅射Zn_(1-x)Cd)_xO薄膜的研究[J]. 半导体学报(英文版), 2003, 24(10): 1053-1056.
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      • Received Date: 2015-08-20

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