Chin. J. Semicond. > 1987, Volume 8 > Issue 1 > 94-98
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a-Si:H/a-SiN_x:H超晶格薄膜的制备及其性质

王志超 , 刘湘娜 , 何宇亮 and 吴汝麟

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    Received: 19 August 2015 Revised: Online: Published: 01 January 1987

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      Article Navigation >  Journal of Semiconductors  > 1987  >  8(1): 94-98
      王志超, 刘湘娜, 何宇亮, 吴汝麟. a-Si:H/a-SiN_x:H超晶格薄膜的制备及其性质[J]. 半导体学报(英文版), 1987, 8(1): 94-98.
      Citation:
      王志超, 刘湘娜, 何宇亮, 吴汝麟. a-Si:H/a-SiN_x:H超晶格薄膜的制备及其性质[J]. 半导体学报(英文版), 1987, 8(1): 94-98.
      shu

      • Received Date: 2015-08-19

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