Chin. J. Semicond. > 1995, Volume 16 > Issue 6 > 468-472
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硼掺杂半导体金刚石薄膜的合成与红外吸收特性

张仿清，谢二庆，杨斌，才永明，陈光华

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    Received: 19 August 2015 Revised: Online: Published: 01 June 1995

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      Article Navigation >  Journal of Semiconductors  > 1995  >  16(6): 468-472
      张仿清，谢二庆，杨斌，才永明，陈光华. 硼掺杂半导体金刚石薄膜的合成与红外吸收特性[J]. 半导体学报(英文版), 1995, 16(6): 468-472.
      Citation:
      张仿清，谢二庆，杨斌，才永明，陈光华. 硼掺杂半导体金刚石薄膜的合成与红外吸收特性[J]. 半导体学报(英文版), 1995, 16(6): 468-472.
      shu

      • Received Date: 2015-08-19

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