Chin. J. Semicond. > 1990, Volume 11 > Issue 8 > 627-634
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快速热氮化超薄SiO_2膜特性的研究

王永顺 , 熊大菁 and 李志坚

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    Received: 19 August 2015 Revised: Online: Published: 01 August 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(8): 627-634
      王永顺, 熊大菁, 李志坚. 快速热氮化超薄SiO_2膜特性的研究[J]. 半导体学报(英文版), 1990, 11(8): 627-634.
      Citation:
      王永顺, 熊大菁, 李志坚. 快速热氮化超薄SiO_2膜特性的研究[J]. 半导体学报(英文版), 1990, 11(8): 627-634.
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      • Received Date: 2015-08-19

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