Chin. J. Semicond. > 1991, Volume 12 > Issue 9 > 536-541
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氢等离子体原位清洁硅衬底表面

沈复初 , 叶必光 , 陈坚 and 龚晨光

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    Received: 19 August 2015 Revised: Online: Published: 01 September 1991

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      Article Navigation >  Journal of Semiconductors  > 1991  >  12(9): 536-541
      沈复初, 叶必光, 陈坚, 龚晨光. 氢等离子体原位清洁硅衬底表面[J]. 半导体学报(英文版), 1991, 12(9): 536-541.
      Citation:
      沈复初, 叶必光, 陈坚, 龚晨光. 氢等离子体原位清洁硅衬底表面[J]. 半导体学报(英文版), 1991, 12(9): 536-541.
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      • Received Date: 2015-08-19

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