Chin. J. Semicond. > 1992, Volume 13 > Issue 8 > 493-498
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杂质对离子注入射程端缺陷的影响

鲍希茂 , 华雪梅 , 袁远 and 洪建明

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    Received: 19 August 2015 Revised: Online: Published: 01 August 1992

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      Article Navigation >  Journal of Semiconductors  > 1992  >  13(8): 493-498
      鲍希茂, 华雪梅, 袁远, 洪建明. 杂质对离子注入射程端缺陷的影响[J]. 半导体学报(英文版), 1992, 13(8): 493-498.
      Citation:
      鲍希茂, 华雪梅, 袁远, 洪建明. 杂质对离子注入射程端缺陷的影响[J]. 半导体学报(英文版), 1992, 13(8): 493-498.
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      • Received Date: 2015-08-19

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