Chin. J. Semicond. > 1983, Volume 4 > Issue 4 > 374-382
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硼离子注入硅的剖面分布

李国辉 , 王兴民 , 卢志恒 , 张通和 and 田淑芸

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    Received: 20 August 2015 Revised: Online: Published: 01 April 1983

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      Article Navigation >  Journal of Semiconductors  > 1983  >  4(4): 374-382
      李国辉, 王兴民, 卢志恒, 张通和, 田淑芸. 硼离子注入硅的剖面分布[J]. 半导体学报(英文版), 1983, 4(4): 374-382.
      Citation:
      李国辉, 王兴民, 卢志恒, 张通和, 田淑芸. 硼离子注入硅的剖面分布[J]. 半导体学报(英文版), 1983, 4(4): 374-382.
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      • Received Date: 2015-08-20

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