Chin. J. Semicond. > 1989, Volume 10 > Issue 2 > 146-147
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磁场对反应离子刻蚀速率影响的研究

金钟元 , 韩阶平 and 马俊如

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    Received: 19 August 2015 Revised: Online: Published: 01 February 1989

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      Article Navigation >  Journal of Semiconductors  > 1989  >  10(2): 146-147
      金钟元, 韩阶平, 马俊如. 磁场对反应离子刻蚀速率影响的研究[J]. 半导体学报(英文版), 1989, 10(2): 146-147.
      Citation:
      金钟元, 韩阶平, 马俊如. 磁场对反应离子刻蚀速率影响的研究[J]. 半导体学报(英文版), 1989, 10(2): 146-147.
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      • Received Date: 2015-08-19

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