Chin. J. Semicond. > 1994, Volume 15 > Issue 12 > 832-837

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超高真空CVD极低温低压硅外延与高分辨TEM分析研究

叶志镇

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    Received: 19 August 2015 Revised: Online: Published: 01 December 1994

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      叶志镇. 超高真空CVD极低温低压硅外延与高分辨TEM分析研究[J]. 半导体学报(英文版), 1994, 15(12): 832-837.
      Citation:
      叶志镇. 超高真空CVD极低温低压硅外延与高分辨TEM分析研究[J]. 半导体学报(英文版), 1994, 15(12): 832-837.

      • Received Date: 2015-08-19

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