Chin. J. Semicond. > 1988, Volume 9 > Issue 5 > 534-539
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共溅法形成钽金属硅化物出现Ta_5Si_3的研究

阎江 and 马俊如

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    Received: 19 August 2015 Revised: Online: Published: 01 May 1988

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      Article Navigation >  Journal of Semiconductors  > 1988  >  9(5): 534-539
      阎江, 马俊如. 共溅法形成钽金属硅化物出现Ta_5Si_3的研究[J]. 半导体学报(英文版), 1988, 9(5): 534-539.
      Citation:
      阎江, 马俊如. 共溅法形成钽金属硅化物出现Ta_5Si_3的研究[J]. 半导体学报(英文版), 1988, 9(5): 534-539.
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      • Received Date: 2015-08-19

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