Chin. J. Semicond. > 2002, Volume 23 > Issue 6 > 604-608
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Si(001)斜切衬底上Ge量子点的固相外延生长

胡冬枝 , 赵登涛 , 蒋伟荣 , 施斌 , 顾骁骁 , 张翔九 and 蒋最敏

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Key words: 量子点, Ge, 固相外延

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    Received: 19 August 2015 Revised: Online: Published: 01 June 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(6): 604-608
      胡冬枝, 赵登涛, 蒋伟荣, 施斌, 顾骁骁, 张翔九, 蒋最敏. Si(001)斜切衬底上Ge量子点的固相外延生长[J]. 半导体学报(英文版), 2002, 23(6): 604-608.
      Citation:
      胡冬枝, 赵登涛, 蒋伟荣, 施斌, 顾骁骁, 张翔九, 蒋最敏. Si(001)斜切衬底上Ge量子点的固相外延生长[J]. 半导体学报(英文版), 2002, 23(6): 604-608.
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      • Received Date: 2015-08-19

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