Chin. J. Semicond. > 2003, Volume 24 > Issue 10 > 1063-1066
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SIMOX硅片埋氧层垂直方向热导率的测量

何平 , 刘理天 , 田立林 , 李志坚 , 董业明 , 陈猛 and 王曦

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Key words: SOI, SIMOX, 热导率, 边界热阻

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    Received: 20 August 2015 Revised: Online: Published: 01 October 2003

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      Article Navigation >  Journal of Semiconductors  > 2003  >  24(10): 1063-1066
      何平, 刘理天, 田立林, 李志坚, 董业明, 陈猛, 王曦. SIMOX硅片埋氧层垂直方向热导率的测量[J]. 半导体学报(英文版), 2003, 24(10): 1063-1066.
      Citation:
      何平, 刘理天, 田立林, 李志坚, 董业明, 陈猛, 王曦. SIMOX硅片埋氧层垂直方向热导率的测量[J]. 半导体学报(英文版), 2003, 24(10): 1063-1066.
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      • Received Date: 2015-08-20

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