Chin. J. Semicond. > 1983, Volume 4 > Issue 6 > 526-530
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原生掺Si砷化镓单晶微缺陷的研究

何宏家 , 曹福年 , 范缇文 , 白玉珂 , 费雪英 , 王凤莲 and 褚一鸣

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    Received: 20 August 2015 Revised: Online: Published: 01 June 1983

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      Article Navigation >  Journal of Semiconductors  > 1983  >  4(6): 526-530
      何宏家, 曹福年, 范缇文, 白玉珂, 费雪英, 王凤莲, 褚一鸣. 原生掺Si砷化镓单晶微缺陷的研究[J]. 半导体学报(英文版), 1983, 4(6): 526-530.
      Citation:
      何宏家, 曹福年, 范缇文, 白玉珂, 费雪英, 王凤莲, 褚一鸣. 原生掺Si砷化镓单晶微缺陷的研究[J]. 半导体学报(英文版), 1983, 4(6): 526-530.
      shu

      • Received Date: 2015-08-20

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