Chin. J. Semicond. > Volume 18 > Issue 9 > Article Number: 688

CMOS/SOD电路的高温工作特性

顾长志 , 金曾孙 , 孟强 , 邹广田 , 陆剑侠 , 苏秀娣 , 许仲德 , 姚达 and 王怀荣

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Abstract: 采用具有高导热、高绝缘等优异物理性能的金刚石膜作为绝缘理层,利用金刚石膜上的薄层硅(SOD)技术,制作了54HCTO3CMOS/SOD结构的集成电路.对该电路高温下的工作特性进行了研究.结果表明SOD电路在350℃下仍具有正常的逻辑功能,其工作温度明显高于体硅电路。

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History

Manuscript received: 19 August 2015 Manuscript revised: Online: Published: 01 September 1997

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