Chin. J. Semicond. > 1989, Volume 10 > Issue 10 > 775-780
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大功率晶体管刻槽与钝化工艺研究

万积庆 and 廖晓华

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    Received: 19 August 2015 Revised: Online: Published: 01 October 1989

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      Article Navigation >  Journal of Semiconductors  > 1989  >  10(10): 775-780
      万积庆, 廖晓华. 大功率晶体管刻槽与钝化工艺研究[J]. 半导体学报(英文版), 1989, 10(10): 775-780.
      Citation:
      万积庆, 廖晓华. 大功率晶体管刻槽与钝化工艺研究[J]. 半导体学报(英文版), 1989, 10(10): 775-780.
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      • Received Date: 2015-08-19

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