Chin. J. Semicond. > 1997, Volume 18 > Issue 2 > 113-117
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硅衬底上铁电薄膜的自偏压异质结效应

于军 , 周文利 , 曹广军 , 谢基凡 and 吴正元

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    Received: 19 August 2015 Revised: Online: Published: 01 February 1997

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      Article Navigation >  Journal of Semiconductors  > 1997  >  18(2): 113-117
      于军, 周文利, 曹广军, 谢基凡, 吴正元. 硅衬底上铁电薄膜的自偏压异质结效应[J]. 半导体学报(英文版), 1997, 18(2): 113-117.
      Citation:
      于军, 周文利, 曹广军, 谢基凡, 吴正元. 硅衬底上铁电薄膜的自偏压异质结效应[J]. 半导体学报(英文版), 1997, 18(2): 113-117.
      shu

      • Received Date: 2015-08-19

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