Abstract: 本文利用TEM研究了850℃热处理直拉硅单晶中的氧化物沉淀行为。通过不同预处理样品的对比,得出点状沉淀是片状沉淀前身的结论。
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Manuscript received: 20 August 2015 Manuscript revised: Online: Published: 01 February 1993
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