Citation: |
Liu Jizhi, Chen Xingbi. A quasi-3-dimensional simulation method for a high-voltage level-shifting circuit structure[J]. Journal of Semiconductors, 2009, 30(12): 125001. doi: 10.1088/1674-4926/30/12/125001
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Liu J Z, Chen X B. A quasi-3-dimensional simulation method for a high-voltage level-shifting circuit structure[J]. J. Semicond., 2009, 30(12): 125001. doi: 10.1088/1674-4926/30/12/125001.
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A quasi-3-dimensional simulation method for a high-voltage level-shifting circuit structure
DOI: 10.1088/1674-4926/30/12/125001
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Abstract
A new quasi-three-dimensional (quasi-3D) numeric simulation method for a high-voltage level-shifting circuit structure is proposed. The performances of the 3D structure are analyzed by combining some 2D device structures; the 2D devices are in two planes perpendicular to each other and to the surface of the semiconductor. In comparison with Davinci, the full 3D device simulation tool, the quasi-3D simulation method can give results for the potential and current distribution of the 3D high-voltage level-shifting circuit structure with appropriate accuracy and the total CPU time for simulation is significantly reduced. The quasi-3D simulation technique can be used in many cases with advantages such as saving computing time, making no demands on the high-end computer terminals, and being easy to operate.-
Keywords:
- quasi-3D,
- 3D,
- device simulation,
- high-voltage level-shifting
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References
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Proportional views